SURFACE-MORPHOLOGY OF RF-SPUTTERED BISMUTH TITANATE THIN-FILMS

被引：5

作者：

GHOSH, PK ^{[1
]}

BHALLA, AS ^{[1
]}

CROSS, LE ^{[1
]}

机构：

[1] PENN STATE UNIV,MAT RES LAB,UNIVERSITY PK,PA 16802

来源：

JOURNAL OF MATERIALS SCIENCE | 1994年 / 29卷 / 17期

关键词：

D O I：

10.1007/BF00376293

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Bismuth titanate (Bi4Ti3O12) thin films were prepared by the r.f. sputtering technique. A bismuth-rich target was used to compensate for the loss of bismuth during deposition. Studies on many films, deposited under various conditions, showed that existence of non-uniform erosion leads to many surface morphological features. This varying surface structure is a consequence of the resputtering process. Because the microstructure has a significant effect on the films electrical/optical response, a knowledge of its dependency on process parameters is an important step towards device development.

引用

页码：4659 / 4662

页数：4

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