SIGNIFICANCE OF NEGATIVE-ION FORMATION IN SPUTTERING AND SIMS ANALYSIS

被引：97

作者：

CUOMO, JJ ^{[1
]}

GAMBINO, RJ ^{[1
]}

HARPER, JME ^{[1
]}

KUPTSIS, JD ^{[1
]}

WEBBER, JC ^{[1
]}

机构：

[1] IBM CORP,DIV SYST PROD,E FISHKILL,NY 12533

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 02期

关键词：

D O I：

10.1116/1.569571

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：281 / 287

页数：7

共 10 条

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[3] EFFECT OF SECONDARY ELECTRONS AND NEGATIVE-IONS ON SPUTTERING OF FILMS
HANAK, JJ
PELLICANE, JP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 406 - 409
[4] HARPER JL, UNPUBLISHED
[5] SPUTTERING YIELD MEASUREMENTS WITH LOW-ENERGY METAL ION BEAMS
HAYWARD, WH
WOLTER, AR
[J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (07) : 2911 - &
[6] Hotop H., 1975, Journal of Physical and Chemical Reference Data, V4, P539, DOI 10.1063/1.555524
[7] IONOV NI, 1972, PROGR SURFACE IONIZA, V1, P237
[8] RELATION BETWEEN AN ATOMIC ELECTRONEGATIVITY SCALE AND WORK FUNCTION
MICHAELSON, HB
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1978, 22 (01) : 72 - 80
[9] Moore C.E, 1970, NATL STAND REF DATA, V34
[10] NBS427 SPEC PUB