SCALE-UP PROBLEMS IN ELECTRON-BEAM EVAPORATION AND SPUTTERING

被引:4
作者
HUGHES, JL
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 04期
关键词
D O I
10.1116/1.569813
中图分类号
O59 [应用物理学];
学科分类号
摘要
A variety of problems are encountered in the scale-up of electron-beam evaporation and sputtering processes from bell jar experiments to production processes. These problems include greatly altered outgassing characteristics, the effects of substrate motion, residual gas pressure and deposition rates. The overall efficiencies with which substrates can collect condensing vapor and the energy efficiency of electron beam and sputtering vaporization processes are also significant with respect to reliable production coater designs. Specific considerations and problems are examined with respect to actual processes which have been scaled-up, both successfully and unsuccessfully.
引用
收藏
页码:1572 / 1579
页数:8
相关论文
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