TRIBOLOGICAL BEHAVIOR OF TIN, TICXNY AND TIC COATINGS PREPARED BY UNBALANCED MAGNETRON SPUTTERING TECHNIQUES

被引:39
作者
DENG, JG
BRAUN, M
机构
[1] Royal Institute of Technology, Physics Department, S-104 05 Stockholm
关键词
D O I
10.1016/0257-8972(94)90074-4
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
TiN, TiC and TiCxNy (0<x<1, 0<y<1) coatings were deposited onto AISI 420 substrates by unbalanced magnetron sputtering techniques at the substrate temperature of 350-degrees-C. The structures of all the coatings were examined by X-ray diffraction and Rutherford backscattering spectrometry. TiN and TiCxNy coatings exhibit a strong (111) or (200) preferred orientation. TiC coating exhibits a (220) preferred orientation. The hardness values for all the coatings increase with the carbon content varying between pure TiN and pure TiC coating. The different tribological behavior of TiN, TiC and TiCxNy coatings were investigated and compared. The amount of surface wear was evaluated by optical and scanning electron microscopy. The results of the wear tests show that friction coefficients are in the range 0.17-0.3 for all coatings. The wear lifetimes of the TiCxNy coatings with different carbon concentrations increase with the carbon content from 11 to 32 h. Relative soft TiN coatings exhibit a short wear lifetime, about 3.5 h. In general, the wear behaviors of TiCxNy coatings with high carbon content are superior to those of either TiN or TiC coating.
引用
收藏
页码:49 / 56
页数:8
相关论文
共 9 条
[1]   THE DEPOSITION OF TIN AT LESS THAN 150-DEGREES-C BY REACTIVE MAGNETRON SPUTTER ION PLATING [J].
AHERN, M .
SURFACE & COATINGS TECHNOLOGY, 1990, 43-4 (1-3) :279-287
[2]   MORPHOLOGY AND STRUCTURE OF ION-PLATED TIN, TIC AND TI(C,N) COATINGS [J].
GABRIEL, HM ;
KLOOS, KH .
THIN SOLID FILMS, 1984, 118 (03) :243-254
[3]   MICROSTRUCTURE AND HARDNESS OF TI(C,N) COATINGS ON STEEL PREPARED BY THE ACTIVATED REACTIVE EVAPORATION TECHNIQUE [J].
JACOBSON, BE ;
DESHPANDEY, CV ;
DOERR, HJ ;
KARIM, AA ;
BUNSHAH, RF .
THIN SOLID FILMS, 1984, 118 (03) :285-292
[4]   THE DEVELOPMENT OF THE PVD COATING TIALN AS A COMMERCIAL COATING FOR CUTTING TOOLS [J].
LEYENDECKER, T ;
LEMMER, O ;
ESSER, S ;
EBBERINK, J .
SURFACE & COATINGS TECHNOLOGY, 1991, 48 (02) :175-178
[5]  
MUNZ WD, 1986, J VAC SCI TECHNOL A, V4, P2721
[6]   HARD DIAMOND-LIKE CARBON-FILMS PREPARED BY VARIOUS PHYSICAL VAPOR-DEPOSITION TECHNIQUES [J].
NABOT, JP ;
ANDRE, B ;
CHABERT, JP .
SURFACE & COATINGS TECHNOLOGY, 1991, 45 (1-3) :359-367
[7]  
PETROV I, 1992, J VAC SCI TECHNOL A, V10, P256
[8]   THE EFFECT OF TARGET POWER ON THE NITROGEN PARTIAL-PRESSURE LEVEL AND HARDNESS OF REACTIVELY SPUTTERED TITANIUM NITRIDE COATINGS [J].
SPROUL, WD ;
RUDNIK, PJ ;
GOGOL, CA .
THIN SOLID FILMS, 1989, 171 (01) :171-181
[9]   HIGH-RATE REACTIVE SPUTTERING IN AN OPPOSED CATHODE CLOSED-FIELD UNBALANCED MAGNETRON SPUTTERING SYSTEM [J].
SPROUL, WD ;
RUDNIK, PJ ;
GRAHAM, ME ;
ROHDE, SL .
SURFACE & COATINGS TECHNOLOGY, 1990, 43-4 (1-3) :270-278