LASER CHEMICAL VAPOR-DEPOSITION OF TI FROM TIBR4

被引：14

作者：

CHOU, WB ^{[1
]}

AZER, MN ^{[1
]}

MAZUMDER, J ^{[1
]}

机构：

[1] LASER AIDED MAT PROC LAB,DEPT MECH ENGN,URBANA,IL 61801

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 01期

关键词：

D O I：

10.1063/1.343903

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：191 / 195

页数：5

相关论文

共 21 条

[1] AHSFOLD MNR, 1979, GAS DYNAMICS ENERGY, V4, P73
[2] LASER CHEMICAL VAPOR-DEPOSITION OF SELECTED AREA FE AND W FILMS
ALLEN, SD
TRINGUBO, AB
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (03) : 1641 - 1643
[3] LASER CHEMICAL VAPOR-DEPOSITION - A TECHNIQUE FOR SELECTIVE AREA DEPOSITION
ALLEN, SD
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) : 6501 - 6505
[4] [Anonymous], 1966, J ELECTROCHEM SOC
[5] BAUERLE D, 1986, SPRINGER SERIES MATE, V1, P37
[6] A REVIEW OF LPCVD METALLIZATION FOR SEMICONDUCTOR-DEVICES
COOKE, MJ
[J]. VACUUM, 1985, 35 (02) : 67 - 73
[7] COUPLING COEFFICIENT FOR CW CO2-LASER RADIATION ON STAINLESS-STEEL
DULEY, WW
SEMPLE, DJ
MORENCY, JP
GRAVEL, M
[J]. OPTICS AND LASER TECHNOLOGY, 1979, 11 (06) : 313 - 316
[8] HERMAN IP, 1983, MATERIALS RES SOC S, V17, P9
[9] 3-DIMENSIONAL TRANSIENT THERMAL-ANALYSIS FOR LASER CHEMICAL VAPOR-DEPOSITION ON UNIFORMLY MOVING FINITE SLABS
KAR, A
MAZUMDER, J
[J]. JOURNAL OF APPLIED PHYSICS, 1989, 65 (08) : 2923 - 2934
[10] KOEMON F, 1961, KOGYO KAGUKA ZASSHI, V64, P1914