PRESENCE OF CRITICAL AU-FILM THICKNESS FOR ROOM-TEMPERATURE INTERFACIAL REACTION BETWEEN AU(FILM) AND SI(CRYSTAL SUBSTRATE)

被引:113
作者
OKUNO, K
ITO, T
IWAMI, M
HIRAKI, A
机构
关键词
D O I
10.1016/0038-1098(80)90659-6
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
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页码:493 / 497
页数:5
相关论文
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