TEXTURE AND COLUMNAR GRAIN-STRUCTURE IN OBLIQUELY DEPOSITED CO-NI FILMS

被引:5
作者
HASHIMOTO, T
OKAMOTO, K
FUJIWARA, H
ITOH, K
KAMIYA, M
HARA, K
机构
[1] CHIBA UNIV,COLL ARTS & SCI,CHIBA 260,JAPAN
[2] HIROSHIMA UNIV,FAC SCI,HIROSHIMA 730,JAPAN
[3] KUMAMOTO UNIV,FAC GEN EDUC,KUMAMOTO 860,JAPAN
关键词
D O I
10.1016/0040-6090(91)90296-A
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In order to examine the crystallographic contribution to the formation of the columnar grain structure, the texture and columnar grain structure in obliquely deposited Co1-x-Nix films (x = 0-1) have been investigated by using the X-ray Schulz method, reflection ellipsometry and replica electron microscopy. Films were vapour deposited on glass substrates kept at 213 and 333 K at an incidence angle of 60-degrees. Although there is no appreciable preferred orientation in films prepared at 333 K, the [0001] and [111] textures are observed in films prepared at 213 K. In accordance with the evolution of texture the growth direction of columnar grains deviates from the vapour beam direction towards the film normal and columnar grains form bundles along the direction perpendicular to the incidence plane. This fact is understood by considering the crystallographic enhancement of the adatom movement due to momentum.
引用
收藏
页码:146 / 152
页数:7
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