GOLD SILICIDE PRECIPITATES IN SILICON

被引:8
作者
BAUMANN, FH
SCHROTER, W
机构
[1] Univ Goettingen, Goettingen, West Ger, Univ Goettingen, Goettingen, West Ger
关键词
GOLD AND ALLOYS - Precipitation - HEAT TREATMENT - Annealing - INTERMETALLICS - MICROSCOPES; ELECTRON; -; Applications;
D O I
10.1080/09500838808229613
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This letter describes the precipitation of gold in silicon from a highly supersaturated solution. After saturation of float-zone at 1275 degree C with gold, annealing experiments were performed at 850 degree C for various annealing times. By means of high-resolution electron microscopy, small particles (10-20 nm diameter) consisting of a metastable gold silicide were found. From selected-area diffraction patterns we deduce an orthorhombic unit cell with a equals 0. 960, b equals 0. 768 and c equals 0. 690 nm.
引用
收藏
页码:75 / 80
页数:6
相关论文
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