GOLD SILICIDE PRECIPITATES IN SILICON

被引：8

作者：

BAUMANN, FH

SCHROTER, W

机构：

[1] Univ Goettingen, Goettingen, West Ger, Univ Goettingen, Goettingen, West Ger

来源：

PHILOSOPHICAL MAGAZINE LETTERS | 1988年 / 57卷 / 02期

关键词：

GOLD AND ALLOYS - Precipitation - HEAT TREATMENT - Annealing - INTERMETALLICS - MICROSCOPES; ELECTRON; -; Applications;

D O I：

10.1080/09500838808229613

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This letter describes the precipitation of gold in silicon from a highly supersaturated solution. After saturation of float-zone at 1275 degree C with gold, annealing experiments were performed at 850 degree C for various annealing times. By means of high-resolution electron microscopy, small particles (10-20 nm diameter) consisting of a metastable gold silicide were found. From selected-area diffraction patterns we deduce an orthorhombic unit cell with a equals 0. 960, b equals 0. 768 and c equals 0. 690 nm.

引用

页码：75 / 80

页数：6