DIFFUSION OF GOLD IN SILICON STUDIED BY MEANS OF NEUTRON-ACTIVATION ANALYSIS AND SPREADING-RESISTANCE MEASUREMENTS

被引：116

作者：

STOLWIJK, NA ^{[1
]}

SCHUSTER, B ^{[1
]}

HOLZL, J ^{[1
]}

机构：

[1] UNIV STUTTGART,INST THEORET & ANGEW PHYS,D-7000 STUTTGART 80,FED REP GER

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1984年 / 33卷 / 02期

关键词：

D O I：

10.1007/BF00617619

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：133 / 140

页数：8

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