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- [3] ALKYL RADICAL INVOLVEMENT IN SILICON SURFACE-CHEMISTRY [J]. SURFACE SCIENCE, 1987, 179 (01) : 132 - 142
- [6] HYDROGEN CHEMISORPTION ON SI(111)-(7X7) AND SI(111)-(1X1) SURFACES - A COMPARATIVE INFRARED STUDY [J]. PHYSICAL REVIEW B, 1983, 28 (08): : 4472 - 4479
- [7] HYDRIDE FORMATION ON THE SI(100)-H2O SURFACE [J]. PHYSICAL REVIEW B, 1984, 29 (06): : 3677 - 3680
- [8] EVIDENCE OF DISSOCIATION OF WATER ON THE SI(100)2X1 SURFACE [J]. PHYSICAL REVIEW B, 1984, 29 (12): : 6974 - 6976
- [9] INFRARED STUDY OF THE CHEMISORPTION OF HYDROGEN AND WATER ON VICINAL SI(100) 2X1 SURFACES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 1448 - 1451
- [10] LASER QUENCHED AND IMPURITY INDUCED METASTABLE SI(111)1X1 SURFACES [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 763 - 769