EFFICIENT PERSISTENT SPECTRAL HOLE-BURNING OF FREE-BASE OCTAETHYLPORPHINE ADSORBED ON GAMMA-ALUMINA BETWEEN 1.6-K AND 90-K

被引：20

作者：

SAUTER, B

BRAUCHLE, C

机构：

[1] Institut für Physikalische Chemie, Universität München, W-8000 Munich

来源：

CHEMICAL PHYSICS LETTERS | 1992年 / 192卷 / 2-3期

关键词：

D O I：

10.1016/0009-2614(92)85473-N

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have used persistent spectral hole-burning to investigate free-base octaethylporphine (OEP) physisorbed on gamma-alumina. This system combines the efficient photochemical hole-burning mechanism of free-base porphines with the idea of decoupling the chromophores from the surrounding by using surface attached chromophores. Hole formation of this system is very efficient and very deep holes (> 70% depth) can easily be burnt. The system shows high thermal hole stability. A hole with a hole depth of 17% can be burnt at 90 K and holes burnt at 2.5 K recover after being held at 120 K for 30 min. The temperature dependence of the Debye-Waller factor is very weak. Depending on the excitation wavelength various photoproducts can be generated. The hole-burning mechanism is discussed.

引用

页码：321 / 326

页数：6

共 20 条

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