PHYSICAL AND ELECTRO-CHEMICAL PROPERTIES OF HIGH-RATE ION-BEAM SPUTTERED FE FILMS

被引：7

作者：

LO, J ^{[1
]}

FRANCO, L ^{[1
]}

HUANG, TC ^{[1
]}

WU, TW ^{[1
]}

MILLER, D ^{[1
]}

CAMPBELL, R ^{[1
]}

机构：

[1] IBM CORP,DIV RES,ALMADEN RES CTR,SAN JOSE,CA 95120

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1988年 / 24卷 / 06期

关键词：

D O I：

10.1109/20.92341

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3081 / 3083

页数：3

共 11 条

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[2] MAGNETIC AND STRUCTURAL-PROPERTIES OF HIGH-RATE DUAL ION-BEAM SPUTTERED NIFE FILMS [J].

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[5] WELL-DEFINED UNIAXIAL ANISOTROPY IN IRON FILM FORMED BY ION-BEAM SPUTTERING [J].

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[7]

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[8] DEPOSITION OF RUST PROOF IRON THIN-FILMS WITH SOFT MAGNETIC-PROPERTIES BY DUAL ION-BEAM SPUTTERING [J].

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[9]

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[10]

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