X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF THE REACTION OF N-2+-ION BEAMS WITH NIOBIUM AND TANTALUM METALS

被引：46

作者：

BADRINARAYANAN, S

SINHA, S

机构：

[1] Special Instruments Laboratory, Physical Chemistry Division

来源：

JOURNAL OF APPLIED PHYSICS | 1991年 / 69卷 / 03期

关键词：

D O I：

10.1063/1.347294

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In situ nitrogen-ion implantation of polycrystalline niobium and tantalum was performed and the surface was characterized by x-ray photoelectron spectroscopy (XPS). The XPS chemical shifts indicated the formation of metal nitride. The chemical shift values are calculated theoretically and compared with the experimental values.

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页码：1141 / 1146

页数：6

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