A PATTERN-RECOGNITION TECHNIQUE USING SEQUENCES OF MARKS FOR REGISTRATION IN ELECTRON-BEAM LITHOGRAPHY

被引：13

作者：

HOLBURN, DM

JONES, GAC

AHMED, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571250

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1229 / 1233

页数：5

共 7 条

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[3] Cumming D.H.M., 1981, P MICROCIRCUIT ENG 8, P75
[4] HORWITZ LP, 1961, P I R E, P175
[5] CUMMS-II - AN ELECTRON-BEAM FABRICATING MACHINE WITH ACCURATE REGISTRATION FOR DIRECT FABRICATION AND MASK MAKING
JONES, GAC
AHMED, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1776 - 1779
[6] STEPHANI D, 1981, P MICROCIRCUIT ENG 8, P65
[7] COMPOSITION AND DETECTION OF ALIGNMENT MARKS FOR ELECTRON-BEAM LITHOGRAPHY
WOLF, ED
COANE, PJ
OZDEMIR, FS
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1266 - 1270