COMPOSITION AND DETECTION OF ALIGNMENT MARKS FOR ELECTRON-BEAM LITHOGRAPHY

[1] BERGER MJ, 1974, SCANNING ELECTRON MI, P38

[2] CAHEN O, 1972, 5TH P INT C EL ION B, P92

[3] ELECTRON DETECTION SYSTEM FOR MICROFABRICATION REGISTRATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 1129 - 1129

[4] CHANG THP, 1974, 8TH P INT C EL MICR, V1, P650

[5] DETERMINATION OF KILOVOLT ELECTRON ENERGY DISSIPATION VS PENETRATION DISTANCE IN SOLID MATERIALS [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (13) : 5837 - &

[6] ELECTRON RESISTS FOR MICROCIRCUIT AND MASK PRODUCTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 1033 - &

[7] Herriott D. R., 1974, 1974 International Electron Devices Meeting (IEDM), P21, DOI 10.1109/IEDM.1974.6219623

[8] OZDEMIR FS, 1974, 1974 INT EL DEV M WA

[9] ELECTRON BEAM EXPOSURE SYSTEM FOR INTEGRATED CIRCUITS [J]. MICROELECTRONICS RELIABILITY, 1969, 8 (02) : 101 - &

[10] THORNLEY RFM, 1967, 9 S EL ION LAS BEAM, P94

[1] BERGER MJ, 1974, SCANNING ELECTRON MI, P38

[2] CAHEN O, 1972, 5TH P INT C EL ION B, P92

[3] ELECTRON DETECTION SYSTEM FOR MICROFABRICATION REGISTRATION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06): : 1129 - 1129

[4] CHANG THP, 1974, 8TH P INT C EL MICR, V1, P650

[5] DETERMINATION OF KILOVOLT ELECTRON ENERGY DISSIPATION VS PENETRATION DISTANCE IN SOLID MATERIALS [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (13) : 5837 - &

[6] ELECTRON RESISTS FOR MICROCIRCUIT AND MASK PRODUCTION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 1033 - &

[7] Herriott D. R., 1974, 1974 International Electron Devices Meeting (IEDM), P21, DOI 10.1109/IEDM.1974.6219623

[8] OZDEMIR FS, 1974, 1974 INT EL DEV M WA

[9] ELECTRON BEAM EXPOSURE SYSTEM FOR INTEGRATED CIRCUITS [J]. MICROELECTRONICS RELIABILITY, 1969, 8 (02) : 101 - &

[10] THORNLEY RFM, 1967, 9 S EL ION LAS BEAM, P94