HIGH-TEMPERATURE OXIDATION OF ION-PLATED CRN FILMS

被引：103

作者：

ICHIMURA, H

KAWANA, A

机构：

[1] Central Research Laboratory, Sumitomo Metal Mining Co., Ltd., Nakakokubun, 18-5

来源：

JOURNAL OF MATERIALS RESEARCH | 1994年 / 9卷 / 01期

关键词：

D O I：

10.1557/JMR.1994.0151

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The high-temperature oxidation of CrN films which were deposited onto stainless steel substrates using an are ion plating apparatus was studied at temperatures ranging from 1023 to 1173 K for 0.6 to 480 ks in air. The oxidation rate obtained from mass gain as a function of time was found to fit well to a parabolic time dependence. Formed oxide layers were analyzed by XRD, SEM, and SAM. An activation energy of the oxidation of CrN was slightly lower than that of the self-diffusion coefficient of Cr ion in Cr2O3. It is concluded that the oxidation of CrN is controlled by the outward diffusion of Cr ions through the Cr2O3 layer formed on each CrN grain.

引用

页码：151 / 155

页数：5

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