NITRIDATION OF GAAS-SURFACES USING NITROGEN THROUGH A HOT TUNGSTEN FILAMENT

This letter reports the nitridation of GaAs surfaces using N-2 through a hot tungsten filament. After nitridation, GaAs cap layers were grown by molecular beam epitaxy to form GaAs/GaN/GaAs structures. For these structures, we determine the sheet nitrogen atom concentration by secondary ion mass spectrometry analysis. The sheet nitrogen atom concentration is proportional to the square root of the N-2 pressure, indicating that N-2 molecules are decomposed into nitrogen atoms to adsorb on the GaAs surfaces. The activation energy of this decomposition process is 3.6+/-0.4 eV. (C) 1995 American Institute of Physics.