HIGH-TEMPERATURE X-RAY STANDING-WAVE STUDY - APPLICATION TO MELTING OF MONOLAYERS OF PB ON GE(111) SURFACES

被引：24

作者：

DEV, BN ^{[1
]}

GREY, F ^{[1
]}

JOHNSON, RL ^{[1
]}

MATERLIK, G ^{[1
]}

机构：

[1] MAX PLANCK INST FESTKORPERFORSCH,D-7000 STUTTGART 80,FED REP GER

来源：

EUROPHYSICS LETTERS | 1988年 / 6卷 / 04期

关键词：

D O I：

10.1209/0295-5075/6/4/006

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：311 / 316

页数：6

共 29 条

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[6] CHEMISORPTION OF BROMINE ON CLEAVED SILICON (111) SURFACES - AN X-RAY STANDING WAVE INTERFERENCE SPECTROMETRIC ANALYSIS
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[7] GEOMETRICAL STRUCTURES OF THE GE/SI(111) INTERFACE AND THE SI(111) (7X7) SURFACE
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[J]. PHYSICAL REVIEW LETTERS, 1986, 57 (24) : 3058 - 3061
[8] X-RAY STANDING WAVE STUDIES OF GERMANIUM ADSORBED ON SI(111) SURFACES
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[J]. SURFACE SCIENCE, 1986, 178 (1-3) : 1 - 9
[9] MEASUREMENT OF THE SILICON (111) SURFACE CONTRACTION
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[J]. PHYSICAL REVIEW LETTERS, 1986, 56 (03) : 236 - 239
[10] GE(111) SQUARE-ROOT-3XSQUARE-ROOT-3-PB - THE ATOMIC GEOMETRY
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NIELSEN, M
GREY, F
JOHNSON, RL
[J]. SURFACE SCIENCE, 1986, 178 (1-3) : 927 - 933

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