INTERRELATIONSHIPS BETWEEN PROCESS PARAMETERS, STRUCTURE, AND PROPERTIES OF CVD TUNGSTEN AND TUNGSTEN-RHENIUM ALLOYS

被引：38

作者：

HOLMAN, WR ^{[1
]}

HUEGEL, FJ ^{[1
]}

机构：

[1] UNIV CALIF,LAWRENCE LIVERMORE LAB,LIVERMORE,CA 94550

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 04期

关键词：

D O I：

10.1116/1.1312739

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：701 / 708

页数：8

共 20 条

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REID, WE
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (06) : 561 - &
[2] BRECHER LE, 1973, 4TH P INT C CHEM VAP, P340
[3] CHEUNG H, 1972, 3RD P INT C CHEM VAP, P136
[4] GEUS JW, 1971, CHEMISORPTION REACTI, pCH3
[5] GLASKI FA, 1970, 2 INT C CVD LOS ANG, P839
[6] GREEN JM, 1972, Patent No. 3661636
[7] HASKELL RW, 1970, 2ND P INT C CHEM VAP, P63
[8] TENSILE TEST APPARATUS FOR SMALL RING SPECIMENS
HOLMAN, WR
STILES, EB
FUNG, E
[J]. JOURNAL OF SCIENTIFIC INSTRUMENTS, 1967, 44 (07): : 545 - &
[9] HOLMAN WR, 1971, 2 P INT C CHEM VAP D, P171
[10] HOLMAN WR, 1967, P C CHEM VAP DEP REF, P427