ION-BEAM SPUTTERING OF SILICATE-GLASSES AND OXIDES

被引：13

作者：

BACH, H

机构：

[1] Schott Glaswerke, Germany

来源：

关键词：

Crystalline Oxides - Ion Beam Sputtering - Silicate Glasses - Sputtering Yields;

D O I：

10.1016/0022-3093(88)90110-X

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：36 / 42

页数：7

共 35 条

[1]

ANDERSEN HH, 1980, PHYSICS IONIZED GASE, P421

[2]

ANDERSEN HH, 1981, TOP APPL PHYS, V47, P145, DOI [10.1007/3540105212_9, DOI 10.1007/3540105212_9]

[3]

APPEN AA, 1965, INORG MATER, V1, P525

BACH, H .

RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1975, 25 (03) :209-212

BACH, H ;

HALLWIG, DJ .

RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1984, 81 (1-2) :129-153

[6]

BACH H, 1987, GLASTECH BER-GLASS, V60, P21

BACH, H .

NUCLEAR INSTRUMENTS & METHODS, 1970, 84 (01) :4-&

[8]

Bach H., 1970, Journal of Non-Crystalline Solids, V3, P1, DOI 10.1016/0022-3093(70)90102-X

[9]

BACH H, 1987, GLASTECH BER-GLASS, V60, P33

BACH, H .