PURE AND MIXED TITANIUM, NIOBIUM AND VANADIUM-OXIDES AS SPUTTERED THICK AND THIN-FILMS - CRYSTALLOGRAPHIC PROPERTIES AND PHASE-TRANSITIONS BETWEEN 300 AND 1800K .1. X-RAY-DIFFRACTION INVESTIGATIONS OF THICK-FILMS

被引：6

作者：

GASGNIER, M ^{[1
]}

LAGNEL, F ^{[1
]}

POUMELLEC, B ^{[1
]}

MARUCCO, JF ^{[1
]}

机构：

[1] UNIV PARIS 11,COMPOSES STOECHIOMETR LAB,CNRS,UA 446,F-91405 ORSAY,FRANCE

来源：

THIN SOLID FILMS | 1990年 / 187卷 / 01期

关键词：

D O I：

10.1016/0040-6090(90)90107-O

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Crystallographic properties of transitien metal oxides (MOy and (Ti, M)Oy, with y≈2 and M = Ti, Nb and V) as thick films (thickness e≈1microm) deposited by r.f. sputtering, were studied before and after annealing (up to 1100 K) by X-ray diffraction. TiO2, NbO2 and (Ti,Nb)O2 compounds, initially amorphous, crystallized between 500 and 700 K according to the rutile structure. Sometimes the TiO2 anatase phase was observed. After annealing above 900 K, α- and γ-Nb2O5 compounds formed for NbO2-type samples. For (Ti,Nb)O2 samples TixNbyO2 compounds formed. As-deposited VOy and (Ti,V)Oy thick films were partially crystallized and textures, whatever the experimental conditions. Resistivity measurements and pattern indexation indicated the formation of rutile VO2. © 1990.

引用

页码：25 / 37

页数：13

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