PREPARATION OF SUBOXIDES IN TI-O SYSTEM BY REACTIVE SPUTTERING

[1] BELYANKIN DS, 1954, PHYSICOCHEMICAL SYST

[2] DeVries R. C., 1954, AM CERAM SOC B, V33, P370

[3] EFFECT OF TARGET OXIDATION ON REACTIVE SPUTTERING RATES OF TITANIUM IN ARGON-OXYGEN PLASMAS [J]. THIN SOLID FILMS, 1976, 38 (03) : 271 - 280

[4] Fitzgibbons E.T., 1970, VAPOR DEPOSITED TITA

[5] KINETICS OF REACTIVE SPUTTER DEPOSITION OF TITANIUM OXIDES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (08) : 1201 - 1207

[6] GREINER JH, 1974, J APPL PHYS, V45, P32, DOI 10.1063/1.1662979

[7] HAAS G, 1952, VACUUM, V2

[8] REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES [J]. THIN SOLID FILMS, 1973, 7 (02) : 163 - 176

[9] LAKSHMANAN TK, 1965, AD613563 TECH REP

[10] PULVERIZATION AND DEPTH DISTRIBUTION .4. CATHODE PULVERIZATION OF NB205, TA205 AND WO3 OXIDES [J]. CANADIAN JOURNAL OF PHYSICS, 1970, 48 (02) : 137 - &

[1] BELYANKIN DS, 1954, PHYSICOCHEMICAL SYST

[2] DeVries R. C., 1954, AM CERAM SOC B, V33, P370

[3] EFFECT OF TARGET OXIDATION ON REACTIVE SPUTTERING RATES OF TITANIUM IN ARGON-OXYGEN PLASMAS [J]. THIN SOLID FILMS, 1976, 38 (03) : 271 - 280

[4] Fitzgibbons E.T., 1970, VAPOR DEPOSITED TITA

[5] KINETICS OF REACTIVE SPUTTER DEPOSITION OF TITANIUM OXIDES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (08) : 1201 - 1207

[6] GREINER JH, 1974, J APPL PHYS, V45, P32, DOI 10.1063/1.1662979

[7] HAAS G, 1952, VACUUM, V2

[8] REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES [J]. THIN SOLID FILMS, 1973, 7 (02) : 163 - 176

[9] LAKSHMANAN TK, 1965, AD613563 TECH REP

[10] PULVERIZATION AND DEPTH DISTRIBUTION .4. CATHODE PULVERIZATION OF NB205, TA205 AND WO3 OXIDES [J]. CANADIAN JOURNAL OF PHYSICS, 1970, 48 (02) : 137 - &