IMPACT IONIZATION PROCESS IN AMORPHOUS SELENIUM

被引:27
作者
TSUJI, K [1 ]
TAKASAKI, Y [1 ]
HIRAI, T [1 ]
TAKETOSHI, K [1 ]
机构
[1] NHK JAPAN BROADCASTING CORP,SCI & TECH RES LABS,SETAGAYA KU,TOKYO 157,JAPAN
关键词
D O I
10.1016/0022-3093(89)90079-3
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:94 / 96
页数:3
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