OVERDENSE PLASMA PRODUCTION USING ELECTRON-CYCLOTRON WAVES

被引：55

作者：

TANAKA, M

NISHIMOTO, R

HIGASHI, S

HARADA, N

OHI, T

KOMORI, A

KAWAI, Y

机构：

[1] UBE IND LTD,UBE,YAMAGUCHI 755,JAPAN

[2] MITSUBISHI ELECTR CO,CENT RES LAB,AMAGASAKI,HYOGO 661,JAPAN

来源：

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN | 1991年 / 60卷 / 05期

关键词：

ECR; OVERDENSE PLASMA; ELECTRON CYCLOTRON WAVE; PLASMA PRODUCTION; WAVE PROPAGATION;

D O I：

10.1143/JPSJ.60.1600

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The density limit in ECR plasma production is overcome using electron cyclotron waves. The plasma of 3 x 10(13) cm-3 density is achieved by parallel injection of circularly polarized microwaves with a frequency 2.45 GHz, corresponding to a 400 times higher density than ordinary mode cutoff. It is found that the plasma is produced in the high field side region between the incident position and the ECR point, and this is due to the generation of high energy electrons and the Doppler-shifted cyclotron resonance.

引用

页码：1600 / 1607

页数：8

共 19 条

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