XPS AND AES INVESTIGATIONS OF SILICON OXIDATION BY ION-IMPLANTED OXYGEN

被引：5

作者：

LABUNOV, VA

PROTASEVICH, PV

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1989年 / 39卷 / 1-4期

关键词：

D O I：

10.1016/0168-583X(89)90827-6

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

收藏

页码：466 / 468

页数：3

相关论文

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HEMMENT, PLF ;

MAYDELLONDRUSZ, E ;

STEPHENS, KG ;

BUTCHER, J ;

IOANNOU, D ;

ALDERMAN, J .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 209 (MAY) :157-164

[2]

JAGER HU, 1985, THIN SOLID FILMS, V123, P159

[3]

OHWADA K, 1982, SEMICOND TECHNOL, P25