APPLICATION OF WATER-SOLUBLE CONTRAST ENHANCING MATERIAL TO G-LINE LITHOGRAPHY

被引：2

作者：

ENDO, M

SASAGO, M

HIRAI, Y

OGAWA, K

ISHIHARA, T

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 05期

关键词：

D O I：

10.1116/1.584178

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1600 / 1604

页数：5

共 11 条

[1]

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[2]

Endo M., 1987, Proceedings of the SPIE - The International Society for Optical Engineering, V774, P138, DOI 10.1117/12.940399

[3] CHARACTERISTICS OF WATER-SOLUBLE CONTRAST ENHANCED MATERIALS [J].

ENDO, M ;

SASAGO, M ;

HIRAI, Y ;

OGAWA, K ;

ISHIHARA, T .

KOBUNSHI RONBUNSHU, 1988, 45 (03) :245-251

[4]

ENDO M, 1985, POLYM PREPRINTS JPN, V34, P2893

[5]

Griffing B. F., 1983, ELECTRON DEVICE LETT, V4, P14

[6] A WATER-SOLUBLE CONTRAST ENHANCEMENT LAYER [J].

HALLE, LF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :323-326

[7] STUDY OF HALF-MICRON PHOTOLITHOGRAPHY BY MEANS OF CONTRAST ENHANCED LITHOGRAPHY PROCESS [J].

HIRAI, Y ;

SASAGO, M ;

ENDO, M ;

OGAWA, K ;

MANO, Y ;

ISHIHARA, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :434-438

[8]

NAKAMURA S, 1985, ABURAKAGAKU, V34, P865

[9]

Sasago M., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P321, DOI 10.1117/12.963659

[10]

UCHINO S, 1987, P SPIE, V711, P11

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