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ANALYTICAL STUDY OF PUNCHTHROUGH IN BURIED CHANNEL P-MOSFETS
被引:11
作者
:
SKOTNICKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
CTR NATL ETUD TELECOMMUN,GRENOBLE,FRANCE
CTR NATL ETUD TELECOMMUN,GRENOBLE,FRANCE
SKOTNICKI, T
[
1
]
MERCKEL, G
论文数:
0
引用数:
0
h-index:
0
机构:
CTR NATL ETUD TELECOMMUN,GRENOBLE,FRANCE
CTR NATL ETUD TELECOMMUN,GRENOBLE,FRANCE
MERCKEL, G
[
1
]
PEDRON, T
论文数:
0
引用数:
0
h-index:
0
机构:
CTR NATL ETUD TELECOMMUN,GRENOBLE,FRANCE
CTR NATL ETUD TELECOMMUN,GRENOBLE,FRANCE
PEDRON, T
[
1
]
机构
:
[1]
CTR NATL ETUD TELECOMMUN,GRENOBLE,FRANCE
来源
:
IEEE TRANSACTIONS ON ELECTRON DEVICES
|
1989年
/ 36卷
/ 04期
关键词
:
D O I
:
10.1109/16.22474
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:690 / 705
页数:16
相关论文
共 9 条
[1]
DEVICE DESIGN FOR THE SUBMICROMETER P-CHANNEL FET WITH N+ POLYSILICON GATE
[J].
CHAM, KM
论文数:
0
引用数:
0
h-index:
0
CHAM, KM
;
CHIANG, SY
论文数:
0
引用数:
0
h-index:
0
CHIANG, SY
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1984,
31
(07)
:964
-968
[2]
SIMPLIFIED MODEL FOR SUBPINCHOFF CONDUCTION IN DEPLETION-MODE IGFETS
[J].
HENDRICKSON, TE
论文数:
0
引用数:
0
h-index:
0
HENDRICKSON, TE
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1978,
25
(04)
:435
-441
[3]
Merckel G., 1977, Proceedings of the NATO Advanced Study Institute on Process and Device Modelling for Integrated Circuit Design, P677
[4]
PERFORMANCE LIMITS OF CMOS ULSI
[J].
PFIESTER, JR
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
PFIESTER, JR
;
SHOTT, JD
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
SHOTT, JD
;
MEINDL, JD
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
MEINDL, JD
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1985,
32
(02)
:333
-343
[5]
SHORT-CHANNEL MOST THRESHOLD VOLTAGE MODEL
[J].
RATNAKUMAR, KN
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, DEPT ELECT ENGN, STANFORD, CA 94305 USA
STANFORD UNIV, DEPT ELECT ENGN, STANFORD, CA 94305 USA
RATNAKUMAR, KN
;
MEINDL, JD
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, DEPT ELECT ENGN, STANFORD, CA 94305 USA
STANFORD UNIV, DEPT ELECT ENGN, STANFORD, CA 94305 USA
MEINDL, JD
.
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1982,
17
(05)
:937
-948
[6]
A NEW PUNCHTHROUGH CURRENT MODEL BASED ON THE VOLTAGE-DOPING TRANSFORMATION
[J].
SKOTNICKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
ITE CEMI,WARSAW,POLAND
ITE CEMI,WARSAW,POLAND
SKOTNICKI, T
;
MERCKEL, G
论文数:
0
引用数:
0
h-index:
0
机构:
ITE CEMI,WARSAW,POLAND
ITE CEMI,WARSAW,POLAND
MERCKEL, G
;
PEDRON, T
论文数:
0
引用数:
0
h-index:
0
机构:
ITE CEMI,WARSAW,POLAND
ITE CEMI,WARSAW,POLAND
PEDRON, T
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1988,
35
(07)
:1076
-1086
[7]
THE VOLTAGE-DOPING TRANSFORMATION - A NEW APPROACH TO THE MODELING OF MOSFET SHORT-CHANNEL EFFECTS
[J].
SKOTNICKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
CNET-CNS, Meylan, Fr, CNET-CNS, Meylan, Fr
SKOTNICKI, T
;
MERCKEL, G
论文数:
0
引用数:
0
h-index:
0
机构:
CNET-CNS, Meylan, Fr, CNET-CNS, Meylan, Fr
MERCKEL, G
;
PEDRON, T
论文数:
0
引用数:
0
h-index:
0
机构:
CNET-CNS, Meylan, Fr, CNET-CNS, Meylan, Fr
PEDRON, T
.
IEEE ELECTRON DEVICE LETTERS,
1988,
9
(03)
:109
-112
[8]
VLSI LIMITATIONS FROM DRAIN-INDUCED BARRIER LOWERING
[J].
TROUTMAN, RR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM General Technology Division, Essex Junction
TROUTMAN, RR
.
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1979,
14
(02)
:383
-391
[9]
ION-IMPLANTED THRESHOLD TAILORING FOR INSULATED GATE FIELD-EFFECT TRANSISTORS
[J].
TROUTMAN, RR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST PROD,ESSEX JUNCTION,VT 05452
IBM CORP,DIV SYST PROD,ESSEX JUNCTION,VT 05452
TROUTMAN, RR
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1977,
24
(03)
:182
-192
←
1
→
共 9 条
[1]
DEVICE DESIGN FOR THE SUBMICROMETER P-CHANNEL FET WITH N+ POLYSILICON GATE
[J].
CHAM, KM
论文数:
0
引用数:
0
h-index:
0
CHAM, KM
;
CHIANG, SY
论文数:
0
引用数:
0
h-index:
0
CHIANG, SY
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1984,
31
(07)
:964
-968
[2]
SIMPLIFIED MODEL FOR SUBPINCHOFF CONDUCTION IN DEPLETION-MODE IGFETS
[J].
HENDRICKSON, TE
论文数:
0
引用数:
0
h-index:
0
HENDRICKSON, TE
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1978,
25
(04)
:435
-441
[3]
Merckel G., 1977, Proceedings of the NATO Advanced Study Institute on Process and Device Modelling for Integrated Circuit Design, P677
[4]
PERFORMANCE LIMITS OF CMOS ULSI
[J].
PFIESTER, JR
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
PFIESTER, JR
;
SHOTT, JD
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
SHOTT, JD
;
MEINDL, JD
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
STANFORD UNIV,DEPT ELECT ENGN,STANFORD,CA 94305
MEINDL, JD
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1985,
32
(02)
:333
-343
[5]
SHORT-CHANNEL MOST THRESHOLD VOLTAGE MODEL
[J].
RATNAKUMAR, KN
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, DEPT ELECT ENGN, STANFORD, CA 94305 USA
STANFORD UNIV, DEPT ELECT ENGN, STANFORD, CA 94305 USA
RATNAKUMAR, KN
;
MEINDL, JD
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, DEPT ELECT ENGN, STANFORD, CA 94305 USA
STANFORD UNIV, DEPT ELECT ENGN, STANFORD, CA 94305 USA
MEINDL, JD
.
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1982,
17
(05)
:937
-948
[6]
A NEW PUNCHTHROUGH CURRENT MODEL BASED ON THE VOLTAGE-DOPING TRANSFORMATION
[J].
SKOTNICKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
ITE CEMI,WARSAW,POLAND
ITE CEMI,WARSAW,POLAND
SKOTNICKI, T
;
MERCKEL, G
论文数:
0
引用数:
0
h-index:
0
机构:
ITE CEMI,WARSAW,POLAND
ITE CEMI,WARSAW,POLAND
MERCKEL, G
;
PEDRON, T
论文数:
0
引用数:
0
h-index:
0
机构:
ITE CEMI,WARSAW,POLAND
ITE CEMI,WARSAW,POLAND
PEDRON, T
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1988,
35
(07)
:1076
-1086
[7]
THE VOLTAGE-DOPING TRANSFORMATION - A NEW APPROACH TO THE MODELING OF MOSFET SHORT-CHANNEL EFFECTS
[J].
SKOTNICKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
CNET-CNS, Meylan, Fr, CNET-CNS, Meylan, Fr
SKOTNICKI, T
;
MERCKEL, G
论文数:
0
引用数:
0
h-index:
0
机构:
CNET-CNS, Meylan, Fr, CNET-CNS, Meylan, Fr
MERCKEL, G
;
PEDRON, T
论文数:
0
引用数:
0
h-index:
0
机构:
CNET-CNS, Meylan, Fr, CNET-CNS, Meylan, Fr
PEDRON, T
.
IEEE ELECTRON DEVICE LETTERS,
1988,
9
(03)
:109
-112
[8]
VLSI LIMITATIONS FROM DRAIN-INDUCED BARRIER LOWERING
[J].
TROUTMAN, RR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM General Technology Division, Essex Junction
TROUTMAN, RR
.
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1979,
14
(02)
:383
-391
[9]
ION-IMPLANTED THRESHOLD TAILORING FOR INSULATED GATE FIELD-EFFECT TRANSISTORS
[J].
TROUTMAN, RR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST PROD,ESSEX JUNCTION,VT 05452
IBM CORP,DIV SYST PROD,ESSEX JUNCTION,VT 05452
TROUTMAN, RR
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1977,
24
(03)
:182
-192
←
1
→