ELECTRON KINETICS IN A COLLISION-DOMINATED SIH4 RF-PLASMA INCLUDING SELF-CONSISTENT RF-FIELD STRENGTH CALCULATION

被引：16

作者：

WINKLER, R

CAPITELLI, M

GORSE, C

WILHELM, J

机构：

[1] UNIV BARI,DEPARTIMENTO CHIM,I-70124 BARI,ITALY

[2] CNR,CTR STUDIO CHIM PLASMI,I-70126 BARI,ITALY

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 1990年 / 10卷 / 03期

关键词：

Electron kinetics; modulation of n[!sub]e[!/sub] and T[!sub]e[!/sub; rf discharge; rf field strength; SiH[!sub]4[!/sub;

D O I：

10.1007/BF01447201

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

The electron kinetics of a collision-dominated rf plasma in silane has been studied by solving the nonstationary electron Boltzmann equation. Ionization and attachment processes and the spatially averaged electron loss to the plasma wall by ambipolar diffusion have been included in the kinetic approach. This makes it possible to calculate, in addition to the time-resolved energy distribution, the self-consistent rf field amplitude which is necessary for the maintenance of the steady-state rf discharge. The impact of the rf field frequency, of the density ratio of negative ions to electrons, and of superelastic (second kind) collisions with excited silane molecules was studied. In particular, large, rf field amplitudes of about 100 V cm-1 Torr-1 result, connected with large modulations of the energy distribution for field frequencies in the megahertz region. © 1990 Plenum Publishing Corporation.

引用

页码：419 / 442

页数：24