ANNEALING OF PHOSPHORUS IMPLANTED SILICON-WAFERS BY MULTISCANNING ELECTRON-BEAM - SOLAR-CELLS APPLICATION

被引：9

作者：

BENTINI, GG

GALLONI, R

GABILLI, E

NIPOTI, R

OLZI, E

SERVIDORI, M

TURISINI, G

ZIGNANI, F

机构：

[1] C.N.R. Istituto LAMEL, via Castagnoli 1, 40126 Bologna, Italy

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 11期

关键词：

All Open Access; Bronze;

D O I：

10.1063/1.328625

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

27

引用

收藏

页码：6735 / 6742

页数：8

相关论文

共 27 条

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