OBSERVATION OF A STRONG DOSE DEPENDENCE IN CO-57 IMPLANTATIONS IN SI AND GE

被引:14
作者
LANGOUCHE, G
DEZSI, I
VANROSSUM, M
DEBRUYN, J
COUSSEMENT, R
机构
[1] Instituut voor Kern- en Stralingsfysika, Physics Department, University of Leuven, Heverlee
来源
PHYSICA STATUS SOLIDI B-BASIC RESEARCH | 1979年 / 93卷 / 02期
关键词
D O I
10.1002/pssb.2220930246
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
[No abstract available]
引用
收藏
页码:K107 / K110
页数:4
相关论文
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PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1978, 89 (01) :K17-K19
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[4]   EVIDENCE OF ELECTRIC QUADRUPOLE COUPLING OF FE-57 IMPLANTED IN SILICON [J].
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PHYSICS LETTERS A, 1977, 64 (03) :311-312
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SAWICKA BD, 1976, J PHYS, V37, pC6
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