THEORIES OF DISTRIBUTION OF DEPOSIT FROM SPUTTERED DISK AND RECTANGULAR ELECTRODES

被引：8

作者：

JONES, RE

机构：

来源：

关键词：

D O I：

10.1147/rd.161.0027

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：27 / &

共 6 条

[1]

Hippel AV, 1926, ANN PHYSIK, V81, P1043

[2]

Holland L., 1952, VACUUM, V2, P346, DOI 10.1016/0042-207X(52)93784-6

[3]

HOLLAND L, 1956, VACUUM DEPOSITION TH, P149

[4] DISTRIBUTION OF MATERIAL SPUTTERED FROM A DISK ELECTRODE [J].

SCHWARTZ, GC ;

JONES, RE ;

MAISSEL, LI .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (03) :351-&

[5] ANGULAR DISTRIBUTION OF SPUTTERED MATERIAL [J].

WEHNER, GK ;

ROSENBERG, D .

[6] MOMENTUM TRANSFER IN SPUTTERING BY ION BOMBARDMENT [J].

WEHNER, GK .