PROCESS INTEGRATION FOR ACTIVE POLYSILICON RESONANT MICROSTRUCTURES

被引：31

作者：

PUTTY, MW

CHANG, SC

HOWE, RT

ROBINSON, AL

WISE, KD

机构：

[1] UNIV CALIF BERKELEY,DEPT ELECT ENGN & COMP SCI,BERKELEY SENSOR & ACTUATOR CTR,BERKELEY,CA 94720

[2] UNIV MICHIGAN,DEPT ELECT ENGN & COMP SCI,SOLID STATE ELECTR LAB,ANN ARBOR,MI 48109

来源：

SENSORS AND ACTUATORS | 1989年 / 20卷 / 1-2期

关键词：

D O I：

10.1016/0250-6874(89)87112-4

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：143 / 151

页数：9

共 13 条

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[2]

FAN LS, 1988, JUN IEEE SOL STAT SE, P55

[3] A SIMPLE TECHNIQUE FOR THE DETERMINATION OF MECHANICAL STRAIN IN THIN-FILMS WITH APPLICATIONS TO POLYSILICON [J].

GUCKEL, H ;

RANDAZZO, T ;

BURNS, DW .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (05) :1671-1675

[4]

GUCKEL H, 1988, JUN IEEE SOL STAT SE, P96

[5]

GUCKEL H, 1987, 4TH INT C SOL STAT S, P277

[6]

HOWE RT, 1984, THESIS U CALIFORNIA

[7]

HOWE RT, 1987, JTH P INT C SOL STAT, P843

[8]

HOWE RT, 1988, J VAC SCI TECHNOL B, V6, P809

[9]

HOWE RT, 1985, MICROMACHINING MICRO, P169

[10] EFFECT OF PHOSPHORUS DOPING ON STRESS IN SILICON AND POLYCRYSTALLINE SILICON [J].

MURARKA, SP ;

RETAJCZYK, TF .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (04) :2069-2072

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