SRTIO3/YBA2CU3O7-DELTA-BILAYERS - FABRICATION AND CHARACTERIZATION

被引:6
作者
EIDELLOTH, W
LEVY, A
CHANG, BP
GALLAGHER, WJ
机构
[1] MIT,DEPT PHYS,CAMBRIDGE,MA 02139
[2] MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
来源
PHYSICA C | 1992年 / 194卷 / 1-2期
关键词
D O I
10.1016/0921-4534(92)90675-3
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the deposition and characterization of SrTiO3/YBa2Cu3O7-delta bilayers with SrTiO3 thickness up to 0.7-mu-m. The films were grown by laser ablation onto NdGaO3 and also onto Nb-doped SrTiO3 substrates. Investigations by X-ray diffraction revealed very good crystallinity and (100) orientation of the SrTiO3 films. The relative permittivity was found to increase from 320 at room temperature to 780 at 65 K. The dielectric breakdown of a 4500 angstrom thick SrTiO3 film at 4.2 K occurred asymmetrically at 6.2 X 1O(4) V/cm and 2.2 X 10(5) V/cm. The highly oriented YBa2CU3O7-delta films deposited on top of these insulating layers had T(c)(R = 0) > 90 K and J(c) (77 K) greater-than-or-similar-to 2.7 x 1O(6) A/cm2.
引用
收藏
页码:92 / 96
页数:5
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