QUANTITATIVE COMPARISON OF TI AND TIO SURFACES USING AUGER-ELECTRON AND SOFT-X-RAY APPEARANCE POTENTIAL SPECTROSCOPIES

被引：52

作者：

GRANT, JT

HAAS, TW

HOUSTON, JE

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

[2] AEROSP RES LABS,WRIGHT PATTERSON AFB,OH 45433

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 01期

关键词：

D O I：

10.1116/1.1318575

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：227 / 230

页数：4

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