QUANTITATIVE AUGER ANALYSIS USING INTEGRATION TECHNIQUES

被引：59

作者：

GRANT, JT

HAAS, TW

HOUSTON, JE

机构：

[1] USAF,AEROSP RES LABS,WRIGHT PATTERSON AFB,OH 45433

[2] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

PHYSICS LETTERS A | 1973年 / A 45卷 / 04期

关键词：

D O I：

10.1016/0375-9601(73)90092-3

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

收藏

页码：309 / 310

页数：2

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共 6 条

[1] FINE STRUCTURES AND ENERGY-DISTRIBUTION OF SECONDARY ELECTRON EMISSION FROM SI(111)
GOTO, K
ISHIKAWA, K
[J]. JOURNAL OF APPLIED PHYSICS, 1973, 44 (01) : 132 - 137
[2] Haas T. W., 1970, Applied Physics Letters, V16, P172, DOI 10.1063/1.1653149
[3] ANALYSIS OF MATERIALS BY ELECTRON-EXCITED AUGER ELECTRONS
HARRIS, LA
[J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (03) : 1419 - &
[4] INSTRUMENT RESPONSE FUNCTIONS FOR POTENTIAL MODULATION DIFFERENTIATION
HOUSTON, JE
PARK, RL
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1972, 43 (10) : 1437 - &
[5] RESOLUTION AND SENSITIVITY CONSIDERATIONS OF AN AUGER ELECTRON SPECTROMETER BASED ON DISPLAY LEED OPTICS
TAYLOR, NJ
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1969, 40 (06) : 792 - &
[6] DETERMINATION OF SURFACE STRUCTURES USING LEED AND ENERGY ANALYSIS OF SCATTERED ELECTRONS
WEBER, RE
JOHNSON, AL
[J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (01) : 314 - &