EVIDENCE FOR THE DEFECT-POOL MODEL FROM INDUCED RECOMBINATION LEVEL SHIFTS IN UNDOPED A-SIH

被引:18
作者
BALBERG, I
LUBIANIKER, Y
机构
[1] Racah Institute of Physics, Hebrew University
来源
PHYSICAL REVIEW B | 1993年 / 48卷 / 12期
关键词
D O I
10.1103/PhysRevB.48.8709
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The measured dependence of the mobility-lifetime products for electrons and holes, on the relative position of the dark Fermi level E(F) in undoped hydrogenated amorphous silicon, a-Si:H, is reported here. The corresponding measurements, which also included the E(F) dependencies of the light-intensity exponents gamma and S, became feasible due to the use of a combination of metal-oxide-semiconductor and photocarrier grating configurations. We found that the experimental results of the S(E(F)) dependence are very helpful in determining which of the models proposed for the recombination-center distribution in the mobility gap of a-Si:H is the most appropriate one.
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页码:8709 / 8714
页数:6
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