ELECTRON-MICROSCOPY STUDY OF THE STRUCTURE OF CR FILMS DEPOSITED ON LOW-TEMPERATURE KCL SUBSTRATES

被引:6
作者
IMURA, T
ISHIHARA, N
OKADA, M
KATOH, M
机构
[1] NISSEI SANGYO CO LTD,CTR SCI INSTRUMENTS,MINATO KU,TOKYO,JAPAN
[2] HIROSHIMA UNIV,FAC FISHERIES & ANIM HUSB,CHEM PHYS LAB,FUKUYAMA 720,JAPAN
关键词
D O I
10.1016/0039-6028(79)90395-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Thin chromium films (≲ 150 Å thick) have been prepared by vapour deposition onto cleaved surfaces of potassium chloride, which were held at temperatures in the range of 297-90 K. The structural form of the films has been studied by transmission electron microscopy and electron diffraction. It was found that a critical temperature exists, above or below which the structure of the deposited film is crystalline or amorphous, respectively. This critical substrate temperature decreased as the rate of deposition increased. © 1979.
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页码:196 / 199
页数:4
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