ELECTROCHEMICAL PHOTOCAPACITANCE OF ZNSE - EFFECT OF PHOTOELECTROCHEMICAL ETCHING

被引：6

作者：

TENNE, R

HAAK, R

TRIBOULET, R

机构：

[1] ROCKWELL INT CORP,CTR SCI,THOUSAND OAKS,CA 91360

[2] CNRS,PHYS SOLIDES LAB,F-92195 MEUDON,FRANCE

来源：

BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS | 1987年 / 91卷 / 06期

关键词：

Acknowledgements Financial support was provided by the Programme Hospitalier de Recherche Clinique 1993 on aspergillosis; the University sClaude Bernard Lyon 1; the Groupe de Recherche sur les Infections Fongiques; and Merck and Co;

D O I：

10.1002/bbpc.19870910603

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：597 / 599

页数：3

共 17 条

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