PREPARATION AND ELECTRICAL-PROPERTIES OF STOICHIOMETRIC TIB2 THIN-FILMS

[1] MORPHOLOGY OF CHEMICAL VAPOR-DEPOSITED TITANIUM DIBORIDE [J]. JOURNAL OF CRYSTAL GROWTH, 1975, 31 (DEC) : 60 - 65

[2] ANALYSIS OF CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE .1. EQUILIBRIUM THERMODYNAMIC ANALYSIS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (05) : 786 - 790

[3] ANALYSIS OF CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE .2. MODELING KINETICS OF DEPOSITION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (05) : 790 - 797

[4] STRUCTURE AND PROPERTIES OF REFRACTORY COMPOUNDS DEPOSITED BY DIRECT EVAPORATION [J]. THIN SOLID FILMS, 1977, 40 (JAN) : 169 - 182

[5] Castaing J., 1977, Boron and refractory borides, P390

[6] CHAMBERLAIN MB, 1980, J VAC SCI TECHNOL, V15, P240

[7] Feldman C., 1976, Twelfth IEEE Photovoltaic Specialists Conference 1976, P100

[8] Feldman C., 1980, Fourteenth IEEE Photovoltaic Specialists Conference 1980, P391

[9] FELDMAN C, 1980, 1ST SOL EN RES I Q R

[10] FELDMAN C, 1980, 2ND SOL EN RES I Q R

[1] MORPHOLOGY OF CHEMICAL VAPOR-DEPOSITED TITANIUM DIBORIDE [J]. JOURNAL OF CRYSTAL GROWTH, 1975, 31 (DEC) : 60 - 65

[2] ANALYSIS OF CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE .1. EQUILIBRIUM THERMODYNAMIC ANALYSIS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (05) : 786 - 790

[3] ANALYSIS OF CHEMICAL VAPOR-DEPOSITION OF TITANIUM DIBORIDE .2. MODELING KINETICS OF DEPOSITION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (05) : 790 - 797

[4] STRUCTURE AND PROPERTIES OF REFRACTORY COMPOUNDS DEPOSITED BY DIRECT EVAPORATION [J]. THIN SOLID FILMS, 1977, 40 (JAN) : 169 - 182

[5] Castaing J., 1977, Boron and refractory borides, P390

[6] CHAMBERLAIN MB, 1980, J VAC SCI TECHNOL, V15, P240

[7] Feldman C., 1976, Twelfth IEEE Photovoltaic Specialists Conference 1976, P100

[8] Feldman C., 1980, Fourteenth IEEE Photovoltaic Specialists Conference 1980, P391

[9] FELDMAN C, 1980, 1ST SOL EN RES I Q R

[10] FELDMAN C, 1980, 2ND SOL EN RES I Q R