EFFECT OF ANTIMONY, CHLORIDE-ION, AND GLUE ON COPPER ELECTROREFINING

被引：39

作者：

OKEEFE, TJ ^{[1
]}

HURST, LR ^{[1
]}

机构：

[1] BETHLEHEM STEEL CORP,HOMER RES LAB,BETHLEHEM,PA 18016

来源：

关键词：

D O I：

10.1007/BF00617669

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：109 / 119

页数：11

共 18 条

[1] BRAUN TB, 1976, P INT S COPPER EXTRA, P511
[2] BRENNER A, 1963, ELECTRODEPOSITION AL, V2, P560
[3] FILIMONOVA S, 1957, TSVETNYE METAL, V30, P37
[4] FROLICH PK, 1924, T AM ELECTROCHEM SOC, V46, P67
[5] THE EFFECT OF CHLORIDE IONS ON COPPER DEPOSITION
GAUVIN, WH
WINKLER, CA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1952, 99 (02) : 71 - 77
[6] HOSPADARUK V, 1953, AIME T, V197, P1375
[7] HU EW, 1973, P INT S HYDROMETALLU, P155
[8] EFFECT OF CHLORIDE-ION IN ELECTROWINNING OF COPPER
LAKSHMANAN, VI
MACKINNON, DJ
BRANNEN, JM
[J]. JOURNAL OF APPLIED ELECTROCHEMISTRY, 1977, 7 (01) : 81 - 90
[9] LIVSHITS L, 1954, ZH PRIKLAD KHIM, V27, P298
[10] LORENZ WP, 1975, THESIS U MISSOURI