COMPOSITION PROFILES OF CVD PLATINUM AND PLATINUM SILICIDE BY AUGER-ELECTRON SPECTROSCOPY AND SECONDARY ION MASS-SPECTROMETRY

被引:31
作者
MORABITO, JM [1 ]
RAND, MJ [1 ]
机构
[1] BELL TEL LABS INC,ALLENTOWN,PA 18103
关键词
D O I
10.1016/0040-6090(74)90300-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:293 / 303
页数:11
相关论文
共 24 条
[21]  
RAND MJ, 1973, UNPUBLISHED DATA
[22]   THIN REACTION LAYERS AND SURFACE STRUCTURE OF SILICON(111) [J].
TAYLOR, NJ .
SURFACE SCIENCE, 1969, 15 (01) :169-&
[23]   DIFFUSION IN THIN-FILM TI-AU, TI-PD, AND TI-PT COUPLES [J].
TISONE, TC ;
DROBEK, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :271-+
[24]  
WERNER HW, 1969, DEVELOPMENTS APPLI A, V7, P239