HILLOCK-FREE ALUMINUM THIN FILMS FOR ELECTRONIC DEVICES

被引:25
作者
SATO, K
OI, T
MATSUMAR.H
OKUBO, T
NISHIMUR.T
机构
来源
METALLURGICAL TRANSACTIONS | 1971年 / 2卷 / 03期
关键词
D O I
10.1007/BF02662723
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
引用
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页码:691 / &
相关论文
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