ION-IMPLANTED DIAMOND FILMS AND THEIR TRIBOLOGICAL PROPERTIES

被引:10
作者
WU, RLC
MIYOSHI, K
KORENYIBOTH, AL
GARSCADDEN, A
BARNES, PN
机构
[1] NASA, LEWIS RES CTR, CLEVELAND, OH 44135 USA
[2] CALSPAN CORP, CLEVELAND, OH 44135 USA
[3] WRIGHT PATTERSON AIR FORCE BASE, DAYTON, OH 45433 USA
关键词
D O I
10.1016/0257-8972(93)90304-7
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This paper reports the physical characterization and tribological evaluation of ion-implanted diamond films. Diamond films were produced by microwave plasma, chemical vapor deposition technique. Diamond films with various grain sizes (0.3 and 3 mum) and roughness (9.1 and 92.1 nm r.m.s. respectively) were implanted with C+ (m/e = 12) at an ion energy of 160 eV and a fluence of 6.72 x 10(17) ions cm-2. Unidirectional sliding friction experiments were conducted in ultrahigh vacuum (6.6 x 10(-7) Pa), dry nitrogen and humid air (40% RH) environments. The effects of C+ ion bombardment on fine and coarse-grained diamond films are as follows: the surface morphology of the diamond films did not change; the surface roughness increased (16.3 and 135.3 nm r.m.s.); the diamond structures were damaged and formed a thin layer of amorphous non-diamond carbon; the friction coefficients dramatically decreased in the ultrahigh vacuum (0.1 and 0.4); the friction coefficients decreased slightly in the dry nitrogen and humid air environments.
引用
收藏
页码:589 / 594
页数:6
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