NONLINEAR UV LASER PHOTOCHEMISTRY OF OXYGEN-DEFICIENT CENTERS IN SILICA GLASS

被引：12

作者：

BAGRATASHVILI, VN

RYBALTOVSKII, AO

TSYPINA, SI

机构：

[1] Laser Chemistry Laboratory, Research Center for Laser Technology, USSR Academy of Sciences, 142092 Troitsk, Moscow Region

来源：

SPECTROCHIMICA ACTA PART A-MOLECULAR AND BIOMOLECULAR SPECTROSCOPY | 1990年 / 46卷 / 04期

关键词：

D O I：

10.1016/0584-8539(90)80189-6

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

The paper presents the results of studies into the effect of high-power UV laser radiation on silica glass with a high concentration of oxygen-deficient centers (ODC's) the type of SiGe and SiSi. Irradiation has been demonstrated to cause the destruction of ODC's and formation of E′ and H(II) paramagnetic defect centers as a result of a two-photon absorption process. The discussion covers the mechanisms of laser-induced and thermal post-irradiation reactions involved. © 1990.

引用

页码：665 / 669

页数：5

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