AN APPROACH FOR NANOLITHOGRAPHY USING ELECTRON HOLOGRAPHY

被引：10

作者：

OGAI, K ^{[1
]}

MATSUI, S ^{[1
]}

KIMURA, Y ^{[1
]}

SHIMIZU, R ^{[1
]}

机构：

[1] NEC CORP LTD, FUNDAMENTAL RES LABS, TSUKUBA 305, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1993年 / 32卷 / 12B期

关键词：

ELECTRON HOLOGRAPHY; NANOFABRICATION; ELECTRON INTERFERENCE FRINGES; ELECTRON BIPRISM; FREESTANDING MULTIBIPRISM;

D O I：

10.1143/JJAP.32.5988

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A technique of electron holography was applied to nanofabrication. Electron interference fringes whose spacing was 108 nm were successfully recorded on polymethylmethacrylate (PMMA) resist using a W[100] thermal field emission (TFE) gun and an electron biprism both set on a conventional transmission electron microscope (TEM). Furthermore, we have attempted the fabrication of a free-standing multi-biprism by electron beam lithography and dry etching, leading to a new fabrication method of a nanoscale grating with a short exposure.

引用

页码：5988 / 5992

页数：5

共 4 条

[1]

JOY D, COMMUNICATION

[2] HIGH-RESOLUTION HOLOGRAPHY OBSERVATION OF H-NB2O5 [J].

KAWASAKI, T ;

RU, QX ;

MATSUDA, T ;

BANDO, Y ;

TONOMURA, A .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1991, 30 (10B) :L1830-L1832

[3] MICROFABRICATED SUBMICRON AL-FILAMENT BIPRISM AS APPLIED TO ELECTRON HOLOGRAPHY [J].

OGAI, K ;

KIMURA, Y ;

SHIMIZU, R ;

ISHIBASHI, K ;

AOYAGI, Y ;

NAMBA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (11B) :3272-3276

[4] ELECTRON HOLOGRAMS FOR SUBANGSTROM POINT RESOLUTION [J].

VOLKL, E ;

LICHTE, H .

ULTRAMICROSCOPY, 1990, 32 (02) :177-180

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