SURFACE DOPING AND STABILIZATION OF SI(111) WITH BORON

被引：227

作者：

BEDROSSIAN, P

MEADE, RD

MORTENSEN, K

CHEN, DM

GOLOVCHENKO, JA

VANDERBILT, D

机构：

[1] ROWLAND INST SCI INC,CAMBRIDGE,MA 02142

[2] UNIV WESTERN ONTARIO,DEPT PHYS,LONDON N6A 3K7,ONTARIO,CANADA

来源：

PHYSICAL REVIEW LETTERS | 1989年 / 63卷 / 12期

关键词：

D O I：

10.1103/PhysRevLett.63.1257

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：1257 / 1260

页数：4

共 17 条

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