CHEMICAL ETCHING OF HIGH-TC SUPERCONDUCTING FILMS IN FELIOX-115 SOLUTION

被引:14
作者
TONOUCHI, M [1 ]
SAKAGUCHI, Y [1 ]
KOBAYASHI, T [1 ]
机构
[1] OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1988年 / 27卷 / 01期
关键词
CERAMIC MATERIALS - Thin Films - ETCHING - RARE EARTH COMPOUNDS - Thin Films - YTTRIUM COMPOUNDS - Thin Films;
D O I
10.1143/JJAP.27.L98
中图分类号
O59 [应用物理学];
学科分类号
摘要
A new chemical etching technique of high-T//c superconducting Y-Ba-Cu-O and Er-Ba-Cu-O films has been developed by employing a novel etchant Feliox-115. It offered a diffusion-limited etching. The rate (at 20 degree C) and the activation energy of Y-Ba-Cu-O dissolution were, respectively, 0. 5 mu m/min and 0. 32 ev. The Er compound was etched off more preferentially than the Y one: The etching rate of the former was nearly twice as high as the latter. The degradation of T//c induced during this process was at most 4 K.
引用
收藏
页码:L98 / L100
页数:3
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