THE ELECTRICAL-CONDUCTIVITY OF COPPER AND TIN THIN-FILMS VACUUM-DEPOSITED IN A LATERAL ELECTRIC-FIELD

被引：3

作者：

DAS, VD

GOPALAKRISHNAN, S

机构：

来源：

THIN SOLID FILMS | 1981年 / 81卷 / 02期

关键词：

D O I：

10.1016/0040-6090(81)90299-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：131 / 135

页数：5

共 10 条

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KHAN, IH .

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[4] POSSIBLE INFLUENCE OF ELECTRIC CHARGE EFFECTS ON INITIAL GROWTH PROCESSES OCCURRING DURING VAPOR DEPOSITION OF METAL FILMS ONTO SUBSTRATES INSIDE ELECTRON MICROSCOPE [J].

DOVE, DB .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) :2785-&

[5]

GEORGESCU II, 1973, REV ROUM PHYS, V18, P1257

[6] INFLUENCE OF CHARGE EFFECTS ON GROWTH AND ELECTRICAL RESISTIVITY OF THIN METAL FILMS [J].

KENNEDY, DI ;

HAYES, RE ;

ALSFORD, RW .

JOURNAL OF APPLIED PHYSICS, 1967, 38 (04) :1986-&

[7] SIGNIFICANCE OF ELECTRIC-FIELDS ON GROWTH OF THIN METAL-FILMS [J].

MURR, LE ;

SINGH, HP .

APPLIED PHYSICS LETTERS, 1972, 20 (12) :512-&

[8]

ZILLINKAS R, 1968, LITOV FIZ SB, V8, P939

[9]

ZILLINKAS R, 1968, LITOV FIZ SB, V8, P647

[10]

[No title captured]

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