THE INFLUENCE OF METHANE CONCENTRATION, SUBSTRATE-TEMPERATURE, AND PRESSURE ON THE MORPHOLOGY OF DIAMOND FILMS GROWN BY DC PLASMA-JET CVD

被引:13
作者
BOUDINA, A
FITZER, E
WAHL, G
机构
[1] TECH UNIV KARLSRUHE, INST CHEM TECH, W-7500 KARLSRUHE, GERMANY
[2] ASEA BROWN BOVERI, W-6900 HEIDELBERG, GERMANY
[3] TECH UNIV BRAUNSCHWEIG, INST OBERFLACHENTECH & PLASMATECH, W-3300 BRAUNSCHWEIG, GERMANY
关键词
D O I
10.1016/0925-9635(92)90034-L
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Diamond films have been synthesized via DC are discharge plasma jet chemical vapour deposition. The diamond films have been examined by scanning electron microscopy (SEM), X-ray diffraction, Raman spectroscopy and XPS spectroscopy. It is found that the quality of the deposits comes close to that of natural diamond. Examination of the obtained diamond films by scanning electron microscopy (SEM) shows that the morphologies of these films are strongly affected by synthesis conditions, especially the substrate temperature, the methane concentration, and the total pressure in the deposition chamber. © 1992.
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页码:248 / 254
页数:7
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