INVESTIGATIONS OF ARTIFICIAL NANOSTRUCTURES AND LITHOGRAPHY TECHNIQUES WITH A SCANNING PROBE MICROSCOPE

被引：8

作者：

GRIESINGER, UA

KADEN, C

LICHTENSTEIN, N

HOMMEL, J

LEHR, G

BERGMANN, R

MENSCHIG, A

SCHWEIZER, H

HILLMER, H

KOOPS, HWP

KRETZ, J

RUDOLPH, M

机构：

[1] DEUTSCH BUNDESPOST TELEKOM FORSCHUNGSZENTRUM, DARMSTADT, GERMANY

[2] TH DARMSTADT, INST ANGEW PHYS, D-64289 DARMSTADT, GERMANY

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1993年 / 11卷 / 06期

关键词：

D O I：

10.1116/1.586643

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this article, the examination and realization of nanometer structures by an atomic force and a scanning tunneling microscope (AFM/STM) is reported. Nanometer structures [etched wires and gratings for distributed feedback (DFB) lasers] were investigated down to a width of 50 nm with respect to profile, structure height, and sidewall roughness. Special DFB gratings for fine tuning of the emission wavelength are analyzed with respect to Fourier components of the periodic structure. The use of a STM and an AFM for low voltage electron-beam lithography of artificial nanometer structures will be demonstrated.

引用

页码：2441 / 2445

页数：5

共 11 条

[1]

Barnsley M. F., 1993, FRACTALS EVERYWHERE, Vsecond

[2] SCANNING TUNNELING MICROSCOPY - FROM BIRTH TO ADOLESCENCE [J].